Micro and Nano-structuration of single crystal silicon was already proven to be a powerful technology, enabling for instance the realization of 2D photonic band-gap materials (or photonic crystals). In this talk, we will make a review of different techniques of silicon micro- and nano-structuration, based on plasma processing, which include Deep Reactive Ion Etching (DRIE) and cryogenic plasma etching, leading either to structures with perfectly controlled shapes or randomly structured surfaces of the so-called Black Silicon, respectively. 

Silicon nano-patterning is also considered without the need for high-cost electron-beam or Deep-UV lithography. To this end, low-cost techniques are considered and they include self-assembly of nano-patterns and their subsequent transfer onto the underlying silicon.